Journal of Modern Physics · 2011 · 118 citations · 33 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationOptical MaterialsThin FilmsGlass MaterialsOptical Properties Of SolidsOptical Thin FilmsRefractive IndexThin Film Optical PropertiesThin-film MaterialsAmorphous StructureOptical AbsorptionOptical CharacterizationOptical Thin Film CharacterizationReflectanceSpray PyrolysisThin Oxide FilmsThin-film Optical Characterization
Crystalline and non-crystalline nickel oxide (NiO) thin films were obtained by spray pyrolysis technique (SPT) using nickel acetate tetrahydrate solutions onto glass substrates at different temperatures from 225 to 350℃. Structure of the as-deposited NiO thin films have been examined by X-ray diffraction (XRD) and atomic force microscope (AFM). The results showed that an amorphous structure of the films at low substrate temperature (Ts = 225℃), while at higher Ts ≥ 275℃, a cubic single phase structure of NiO film is formed. The refractive index (n) and the extinction coefficient (k) have been calculated from the corrected transmittance and reflectance measurements over the spectral range from 250 to 2400 nm. Some of the optical absorption parameters, such as optical dispersion energies, Eo and Ed, dielectric constant, ε, the average values of oscillator strength, So, wavelength of single oscillator λo and plasma frequency, ωp, have been evaluated.
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Optical Properties of Semiconductors
H. R. Philipp, Hannelore Ehrenreich · Physical Review · 1963 · 2.1K citations
Optical properties and photoinduced changes in amorphous AsS films
Keiji Tanaka · Thin Solid Films · 1980 · 507 citations