Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 44 citations · 0 references
EngineeringGlow DischargeThin Film Process TechnologyChemical DepositionConventional DischargesMaterials FabricationSuperconductivityThin Film ProcessingThin-film TechnologyMaterials ScienceElectrical EngineeringHollow Cathode DischargeHollow Cathode DischargesMicroelectronicsMicrofabricationSurface ScienceApplied PhysicsThin Film DevicesThin FilmsGas Discharge PlasmaChemical Vapor Deposition
Hollow cathode discharges produce higher densities of sputtered particles than conventional discharges and can be utilized for thin film deposition. A prototype hollow cathode sputter source has therefore been built and tested. The deposition of copper and the superconductor YBa2Cu3O7−x produced thin films of good quality. The method can be upscaled for a uniform deposition of tapes, wires, large-area substrates, and for the parallel deposition of multiple substrates.