Applied Physics Letters · 2011 · 78 citations · 16 references
Wide-bandgap SemiconductorQuantum PhotonicsEngineeringLaser ApplicationsLaser MaterialOptoelectronic DevicesLaser FacetsIngan/gan Quantum DotHigh-power LasersLaser HeterostructuresSemiconductor LasersCompound SemiconductorPhotonicsElectrical EngineeringPhysicsOptoelectronic MaterialsFocused Ion BeamCategoryiii-v SemiconductorApplied PhysicsGan Power DeviceQuantum Photonic DeviceOptoelectronics
The characteristics of self-organized InGaN/GaN quantum dot lasers are reported. The laser heterostructures were grown on c-plane GaN substrates by plasma-assisted molecular beam epitaxy and the laser facets were formed by focused ion beam etching with gallium. Emission above threshold is characterized by a peak at 524 nm (green) and linewidth of 0.7 nm. The lowest measured threshold current density is 1.2 kA/cm2 at 278 K. The slope and wall plug efficiencies are 0.74 W/A and ∼1.1%, respectively, at 1.3 kA/cm2. The value of T0=233 K in the temperature range of 260–300 K.
16
500 nm electrically driven InGaN based laser diodes
Desirée Queren, Adrian Avramescu, G. Brüderl et al. · Applied Physics Letters · 2009 · 149 citations
Wide-bandgap Semiconductor, Photonics, Electrical Engineering +13