Grey scale structures formation in SU-8 with e-beam and UV

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

A. L. Bogdanov, Sergey Peredkov · Microelectronic Engineering · 2000 · 131 citations

Natural Sciences, Materials Engineering, Materials Science +9

Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

Walter Däschner, Robert Stein, Chuck Wu et al. · Applied Optics · 1997 · 99 citations

Engineering, Manufacturing Engineering, Materials Science +14

Refractive micro lens array made of dichromate gelatin with gray-tone photolithography

Jun Yao, Zheng Cui, Fuhua Gao et al. · Microelectronic Engineering · 2001 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +14

Electron beam lithography using chemically-amplified resist: Resolution and profile control

V.A. Kudryashov, S.E. Huq, Philip D. Prewett et al. · Microelectronic Engineering · 1996 · 14 citations

Engineering, Electrical Engineering, Materials Science +16