Japanese Journal of Applied Physics · 2006 · 10 citations · 5 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSurface ScienceThin FilmsMetalsPlasma Surface TreatmentPlasma-surface InteractionsThin Film Electrical PropertiesThin Film Surface MorphologyThin-film DepositionAtomic Force Microscopy Surface AnalysisElectron Beam EvaporationPlasma DepositionPlasma Display PanelsSubstrate Temperature EffectsSurface Roughness ParametersThin Film Surface CharacterizationX-ray Diffraction Analysis
MgO thin film is most widely used as a protecting layer in ac Plasma Display Panel. The film is deposited using electron beam evaporation. The effects of the evaporation rate of MgO film deposited using an electron beam on the MgO properties and the discharge characteristics of the plasma display panel (PDP) were investigated. The evaporation rate was changed from 3 to 15 Å/s at a substrate temperature of 300 °C. MgO properties such as crystal orientation, surface roughness, contact angle, and film structure were inspected using X-ray diffraction (XRD), analysis atomic force microscopy (AFM), drop shape analysis, and secondary electron microscopy (SEM). The MgO properties were shown to be strongly dependent on the evaporation rate. We also studied the relation between MgO properties and PDP discharging characteristics. The minimum firing voltage and maximum luminous efficiency were obtained at an evaporation rate of 5 Å/s. In the MgO film deposited at 5 Å/s, the (200) orientation was most intensive and surface roughness was minimum.
5
Theory of Auger Ejection of Electrons from Metals by Ions
H. D. Hagstrum · Physical Review · 1954 · 1.3K citations