Publication | Closed Access
Characterization of multilayer x-ray mirrors for the λ ⋍ 19 nm range using a laser-plasma radiation source
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References
1993
Year
Optical MaterialsEngineeringLaser ApplicationsLaser PhysicsOptical MetrologyLaser Plasma PhysicX-ray MirrorsHigh-power LasersSynchrotron Radiation SourceX-ray ImagingBeam OpticOptical PropertiesLaser-plasma Radiation SourceMultilayer X-ray MirrorsOptical SystemsRadiation ImagingGraded-reflectivity MirrorsHealth SciencesPhotonicsNm RangePhysicsLaser Beam PropagationSynchrotron RadiationX-ray Free-electron LaserSpectroscopyApplied PhysicsYalo3 LaserX-ray Optic
A laser-plasma radiation source employing the second harmonic of a -switched Nd:YAlO3 laser (λ = 0.54 μm) has been used to study multilayer, normal-incidence, focusing x-ray mirrors. Using a Mo-Si-coated mirror (λ = 19.3 nm) as an example, we have demonstrated the feasibility of measuring the angular resolution (≤1''), the spectral shape of the resonance reflection curve, and its uniformity over an aperture 60 mm in diameter.
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