Bridge and van der Pauw Sheet Resistors for Characterizing the Line Width of Conducting Layers

Abstract

It is shown that the line width of conducting layers can be computed from simple d‐c electrical measurements made on bridge and van der Pauw shaped test structures. A compact six‐contact, cross‐bridge sheet resistor test structure was developed to make this measurement directly. Line widths measured on boron nitride diffused layers indicate that the method is sensitive to width variations of the order of ±0.1 μm (±4 μin.)