Journal of The Electrochemical Society · 1974 · 44 citations · 0 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor MaterialsChemical Vapor DepositionIntegrated Circuit FabricationSemiconductor Device MaterialsSemiconductor Thin FilmsThin-film DepositionThin-film MaterialsAtmospheric PressureAtmospheric Pressure Chemical Vapor DepositionChemical Vapor Deposition MaterialsHydrogen Direct ReductionHydrogen ReductionLow-pressure Chemical Vapor DepositionSilicon Chemical Vapor DepositionTungsten-based Materials
The properties of CVD tungsten films, produced by the hydrogen reduction of or , have been investigated to determine the suitability of the films for use as silicon integrated circuit metallizations. Both low pressure and atmospheric pressure flow system have been investigated.