Applied Physics Letters · 2006 · 106 citations · 16 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsOptoelectronic DevicesOptoelectronic MaterialsOxide SemiconductorsP-n JunctionsPhotodetectorsSemiconductor DetectorsElectron Beam EvaporationHeterojunction PhotodetectorsMolecular Beam EpitaxyOhmic ContactsPhotocurrent GenerationPhotodiodesPhotolithographyWet Etching
ZnO -based p-n homojunctions were grown using molecular-beam epitaxy. Sb and Ga were used as dopants to achieve the p-type and n-type ZnO, respectively. The mesa devices were fabricated by employing wet etching and standard photolithography techniques. Al∕Ti metal was deposited by electron-beam evaporation and annealed to form Ohmic contacts. Current-voltage measurements of the device showed good rectifying behavior, from which a turn-on voltage of about 2V was obtained. Very good response to ultraviolet light illumination was observed from photocurrent measurements.
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ZnO diode fabricated by excimer-laser doping
Toru Aoki, Yoshinori Hatanaka, D. C. Look · Applied Physics Letters · 2000 · 714 citations · Full text