Photoelectron spectroscopy studies of plasma-fluorinated epitaxial graphene

Abstract

Fluorination of graphene has emerged as an attractive approach toward manipulating its physical, chemical, and electronic properties. To this end, we have demonstrated the viability of sulfur hexafluoride plasmas to fluorinate graphene as a safer alternative to the commonly reported techniques of fluorination that include exposures to fluorine and xenon difluoride gas. Incorporation of fluorine moieties on graphene after SF6 plasma-treatment was confirmed by x-ray photoelectron spectroscopy. Modifications in the valence band states of graphene after plasma-treatment were characterized by ultraviolet photoelectron spectroscopy. Increase in work function of plasma-treated graphene demonstrates the ability of plasma-assisted fluorination to modify the electron emission characteristics of graphene. Raman spectroscopy reveals that the majority of carbon atoms in graphene retain their sp2 hybridization after the plasma-treatment.