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Performance improvement of Ge-Sb-Te material by GaSb doping for phase change memory
43
Citations
23
References
2013
Year
Materials ScienceMaterials EngineeringElectrical EngineeringGe-sb-te MaterialEngineeringElectronic StatesCrystal Growth TechnologyElectronic MemoryApplied PhysicsSitu ResistanceGallium OxideSemiconductor MaterialSemiconductor MemoryPerformance ImprovementPhase Change Memory
Effects of GaSb doping on phase change characteristics of Ge-Sb-Te material are investigated by in situ resistance and x-ray diffraction measurement, optical spectroscopy, and x-ray photoelectron spectroscopy. The crystallization temperature and data retention of Ge-Sb-Te material increase significantly by the addition of GaSb, which results from the high thermal stability of amorphous GaSb. In addition, GaSb-doped Ge-Sb-Te material exhibits faster crystallization speed due to the change in electronic states as a result of the formation of chemical bonds with Ga element. Incorporation of GaSb is highly effective way to enhance the comprehensive performance of Ge-Sb-Te material for phase change memory.
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