Development of rf plasma sputtered Al2O3–TiO2 multilayer broad band antireflecting coatings and its correlation with plasma parameters

Nanocrystalline TiO2 studied by optical, FTIR and X-ray photoelectron spectroscopy: correlation to presence of surface states

P.M. Kumar, S. Badrinarayanan, Murali Sastry · Thin Solid Films · 2000 · 721 citations

Natural Sciences, Materials Engineering, Materials Science +16

Control of reactive sputtering processes

W.D. Sproul, D.J. Christie, D.C. Carter · Thin Solid Films · 2005 · 395 citations

Engineering, Manufacturing Engineering, Materials Processing +5

Photocatalytic activity of nanometer TiO2 thin films prepared by the sol–gel method

Jiaguo Yu, Xiujian Zhao, Qingnan Zhao · Materials Chemistry and Physics · 2001 · 360 citations

Natural Sciences, Materials Engineering, Materials Science +16

Raman spectroscopy studies on the thermal stability of TiN, CrN, TiAlN coatings and nanolayered TiN/CrN, TiAlN/CrN multilayer coatings

Harish C. Barshilia, K.S. Rajam · Journal of materials research/Pratt's guide to venture capital sources · 2004 · 232 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating

Sang‐Hun Jeong, Jae‐Keun Kim, Bongsoo Kim et al. · Vacuum · 2004 · 195 citations

Natural Sciences, Materials Engineering, Materials Science +16