Applied Physics Letters · 1996 · 673 citations · 2 references
Materials SciencePhotoelectron SpectroscopyEngineeringTransparent ConductorOxide ElectronicsSurface ScienceApplied PhysicsSemiconductor MaterialWork FunctionIndium Tin OxideThin Film Process TechnologyVacuum DeviceThin FilmsHeat TreatmentThin Film Processing
We used ultraviolet and x-ray photoelectron spectroscopy (XPS) and (UPS) techniques to directly measure absolute values of vacuum work function of indium tin oxide (ITO) thin films. We obtained a work function of 4.4–4.5 eV which is lower than the commonly cited value. These values do not change substantially by heating and Ar ion sputtering. The atomic concentrations of each element in ITO, measured with XPS, are also quite stable under heat treatment and ion sputtering.
2
Handbook of chemistry and physics
Journal of the Franklin Institute · 1930 · 11.7K citations
<i>Low-Energy Electrons and Surface Chemistry</i>
G. Ertl, J. Küppers, Robert L. Park · Physics Today · 1976 · 772 citations
Low‐energy Electrons, Experimental Nuclear Physics, Engineering +12