Applied Physics Letters · 1996 · 682 citations · 2 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsSemiconductor MaterialsThin FilmsElectronic Material CharacterizationOxide SemiconductorsSemiconductor Thin FilmsThin Film Electrical PropertiesThin-film MaterialsX-ray Photoelectron SpectroscopyIndium Tin Oxide Thin FilmsSputteringThin Oxide FilmsThin Oxide LayersTin OxidesUltraviolet Photoelectron SpectroscopyWork FunctionWork Function Determination
We used ultraviolet and x-ray photoelectron spectroscopy (XPS) and (UPS) techniques to directly measure absolute values of vacuum work function of indium tin oxide (ITO) thin films. We obtained a work function of 4.4–4.5 eV which is lower than the commonly cited value. These values do not change substantially by heating and Ar ion sputtering. The atomic concentrations of each element in ITO, measured with XPS, are also quite stable under heat treatment and ion sputtering.
2
Handbook of chemistry and physics
Journal of the Franklin Institute · 1930 · 11.7K citations
<i>Low-Energy Electrons and Surface Chemistry</i>
G. Ertl, J. Küppers, Robert L. Park · Physics Today · 1976 · 773 citations
Natural Sciences, Chemistry, Physics +12