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Donor Levels in Si-Doped AlGaAs Grown by MBE
94
Citations
8
References
1984
Year
Materials EngineeringMaterials ScienceElectrical EngineeringChemical EngineeringDonor LevelsEngineeringAluminium NitrideWide-bandgap SemiconductorSemiconductor TechnologyApplied PhysicsShallow DonorSemiconductor MaterialCurrent Transient Spectroscopy
Donor levels of MBE-grown Si-doped Al x Ga 1- x As have been characterized by a combination of the C-V method and capacitance and current transient spectroscopy. Although most electrons are supplied by so-called DX centers in the AlAs mole fraction (x) range of 0.3∼0.7 in this material, it is found that a small amount of shallow donors are still present. The concentrations of the DX center and the shallow donor are determined in detail as a function of AlAs mole fraction and Si doping level. The activation energy obtained by the Hall effect measurement is discussed in association with these data.
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