physica status solidi (a) · 2008 · 33 citations · 15 references
Natural SciencesMaterials EngineeringMaterials ScienceOpticsSurface ScienceThin FilmsOptical Thin FilmsPlasmonic MaterialsPlasmonicsSurface SpectroscopyThin Film Optical PropertiesThin-film MaterialsDampingEllipsometryInternal ReflectionPlasmonic Thin FilmsReflectanceSensitivitySurface PlasmonsThickness-dependent Optical Properties
Abstract Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter Δ are several orders of magnitude larger. Here, the origin of this large sensitivity is discussed by analysing thin film approximations of the complex reflectance ratio. It is found that the thickness sensitivity in Δ is proportional to the inverse of the difference between the intrinsic and the radiation‐induced damping of the surface plasmons. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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Ellipsometry and polarized light
R. M. A. Azzam, N. M. Bashara, D. Thorburn Burns · Analytica Chimica Acta · 1987 · 1.7K citations