Publication | Closed Access
Highly phosphorus-doped polysilicon films with low tensile stress for surface micromachining using POCl3 diffusion doping
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Citations
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References
1997
Year
Materials SciencePhosphorus-doped Polysilicon FilmsEngineeringMicromachinesMicrofabricationSurface ScienceApplied PhysicsSemiconductor Device FabricationPocl3 DiffusionLow Tensile StressThin Film Process TechnologySilicon On InsulatorMicroelectronicsThin Film Processing
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