Highly phosphorus-doped polysilicon films with low tensile stress for surface micromachining using POCl3 diffusion doping

Solid Solubilities of Impurity Elements in Germanium and Silicon*

F. A. Trumbore · Bell System Technical Journal · 1960 · 1.4K citations

Natural Sciences, Chemistry, Materials Science +15

Dopant segregation in polycrystalline silicon

Mohammad M. Mandurah, Krishna C. Saraswat, C. R. Helms et al. · Journal of Applied Physics · 1980 · 371 citations

Natural Sciences, Materials Science, Physics +17

Grain Growth Mechanism of Heavily Phosphorus‐Implanted Polycrystalline Silicon

Yasuo Wada, Shigeru Nishimatsu · Journal of The Electrochemical Society · 1978 · 246 citations

Engineering, Materials Engineering, Materials Science +17

Fabrication of micromechanical devices from polysilicon films with smooth surfaces

H. Guckel, J.J. Sniegowski, Todd R. Christenson et al. · Sensors and Actuators · 1989 · 176 citations

Engineering, Materials Engineering, Materials Science +13

Principles and Applications of Wafer Curvature Techniques for Stress Measurements in Thin Films

Paul A. Flinn · MRS Proceedings · 1988 · 112 citations

Natural Sciences, Materials Engineering, Materials Science +16