Two-bands charge transport in silicon nitride due to phonon-assisted trap ionization

Abstract

The charge transport in the amorphous Si3N4 is studied experimentally and theoretically. We have found, that widely accepted Frenkel model of the trap ionization gives the unphysical low value of the attempt to escape factor, and the enormously high value of the electron tunnel mass. Experimental data are well described by theory of the two-bands conduction and the phonon-assisted trap ionization in Si3N4.