Structure and properties of (Ti1−Al )N films prepared by reactive sputtering

Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1974 · 2.3K citations

Engineering, Apparatus Geometry, Deposition Conditions +16

Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 942 citations

Sodium Chloride, Crystal Structure, Aluminium Nitride +19

Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum

O. Knotek, W.‐D. Münz, T. Leyendecker · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 305 citations

Tribological Coating, Engineering, Mechanical Engineering +17

Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

G. Håkansson, J.‐E. Sundgren, D.C. McIntyre et al. · Thin Solid Films · 1987 · 237 citations

Materials Engineering, Materials Science, Polycrystalline Metastable Ti0.5al0.5n +8

Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphere

Hermann Jehn, S. Hofmann, Vera‐Ellen Rückborn et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 165 citations

Engineering, Mechanical Engineering, Chemical Deposition +18