Isoelectronic As doping effects on the optical characteristics of GaN films grown by metalorganic chemical-vapor deposition

Huai Huang, Wei-Hao Lin, W. H. Lee, C. K. Shu, Kao‐Shiang Liao, W. K. Chen, Meng-Chieh Lee, W. H. Chen, Y. Y. Lee

Applied Physics Letters · 2000 · 17 citations · 17 references

Concepts

Abstract

We have studied the As doping effects on the optical characteristics of GaN films by time-integrated photoluminescence and time-resolved photoluminescence. When As is incorporated into the film, the localized defect levels and donor–acceptor pair transition become less resolved. The recombination lifetime of neutral-donor-bound exciton (I2) transition in undoped GaN increases with temperature as T1.5. However, the I2 recombination lifetime in As-doped GaN first decreases exponentially from 98 to 41 ps between 12 and 75 K, then increases gradually to 72 ps at 250 K. Such a difference is related to the isoelectronic As impurities in GaN, which generate nearby shallow levels that dominate the recombination process.

References

17