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Isoelectronic As doping effects on the optical characteristics of GaN films grown by metalorganic chemical-vapor deposition
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Citations
17
References
2000
Year
SemiconductorsWide-bandgap SemiconductorElectrical EngineeringSemiconductor TechnologyEngineeringPhysicsSurface ScienceApplied PhysicsOptical CharacteristicsAluminum Gallium NitrideTime-resolved PhotoluminescenceGan Power DeviceGallium OxideAs Doping EffectsCategoryiii-v SemiconductorOptoelectronicsMetalorganic Chemical-vapor DepositionGan Films
We have studied the As doping effects on the optical characteristics of GaN films by time-integrated photoluminescence and time-resolved photoluminescence. When As is incorporated into the film, the localized defect levels and donor–acceptor pair transition become less resolved. The recombination lifetime of neutral-donor-bound exciton (I2) transition in undoped GaN increases with temperature as T1.5. However, the I2 recombination lifetime in As-doped GaN first decreases exponentially from 98 to 41 ps between 12 and 75 K, then increases gradually to 72 ps at 250 K. Such a difference is related to the isoelectronic As impurities in GaN, which generate nearby shallow levels that dominate the recombination process.
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