X-ray lithography using a pulsed plasma source

Abstract

An imploding gas jet plasma has been developed as a soft x-ray source for lithographic applications. The plasma is an efficient source of krypton L radiation, which closely matches the wavelength of tungsten anode electron bombardment sources. Resist exposures have been made to evaluate the suitability of the source and determine the filtering requirements necessary to protect the resist. COP resist required 20 shots for a proper exposure; no reciprocity failure was observed with these pulsed, high-power exposures.