Publication | Closed Access
Application of electrolytic in-process dressing (ELID) grinding and chemical mechanical polishing (CMP) process for emerging hard–brittle materials used in light-emitting diodes
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Citations
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References
2011
Year
Materials EngineeringMaterials ScienceEngineeringHard–brittle MaterialsMaterial ProcessingMechanical EngineeringChemical Mechanical PolishingElectrolytic In-process DressingAbrasive Machining
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