Evaluation of precursors for chemical vapor deposition of ruthenium

References

Page 1

	Year	Citations
Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Films M. L. Green, M. E. Gross, Letizia Papa, Journal of The Electrochemical Society Materials ScienceMaterial AnalysisEngineeringRuthenium Dioxide FilmsExcellent Adhesion	1985	233
Chemical Vapor Deposition at Low Temperatures J.C. Viguie Journal of The Electrochemical Society Chemical EngineeringEngineeringSurface ScienceApplied PhysicsThermodynamics	1975	228
Structures and Bond Energies of the Transition-Metal Carbonyls M(CO)5 (M = Fe, Ru, Os) and M(CO)4 (M = Ni, Pd, Pt) Andreas W. Ehlers, Gernot Frenking Organometallics Materials ScienceInorganic ChemistryChemical EngineeringEngineeringTransition-metal Carbonyls M	1995	114
Measurement of active carbon on ruthenium (110): Relevance to catalytic methanation D. Wayne Goodman, J. M. White Surface Science Chemical EngineeringCarbonizationEngineeringIndustrial CatalysisCatalytic Methanation	1979	106
Reactions of cyclopentadiene with carbonyl-ruthenium and -osmium complexes Adrian Humphries, Selby A. R. Knox Journal of the Chemical Society Dalton Transactions Inorganic ChemistryChemical EngineeringDirect PrecursorEngineeringHeterocyclic	1975	86
A 3-dimensional model for low-pressure chemical-vapor-deposition step coverage in trenches and circular vias M. Mazhar IslamRaja, Mark Cappelli, J.P. McVittie, Journal of Applied Physics EngineeringStep CoverageComputational MechanicsChemical DepositionParticle Transport	1991	84
DFT calculations of the binding energy of metallocenes María J. Mayor-López, Jacques Weber Chemical Physics Letters EngineeringPhysicsNatural SciencesSpectra-structure CorrelationPhysical Chemistry	1997	74
Preparation and Crystal Structures of RuC and OsC Charles P. Kempter, Moshe Nadler The Journal of Chemical Physics Materials ScienceInorganic ChemistryM. R. NadlerNovember 1960Engineering	1960	72
The behaviour of CO adsorbed on Ru(1,1,10) and Ru(001); the dissociation of CO at the step sites of the Ru(1,1,10) surface Eriko Shincho, Chikashi Egawa, Shuichi Naito, Surface Science EngineeringPhysicsSurface ChemistryNatural SciencesSurface Science	1985	65
Chemical Vapor Deposition of Metallic Thin Films Using Homonuclear and Heteronuclear Metal Carbonyls E. P. Boyd, Douglas R. Ketchum, Haibin Deng, Chemistry of Materials Materials ScienceMaterials EngineeringChemical EngineeringHigh Temperature MaterialsMetallic Thin Films	1997	63

Page 1