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Detailed analysis of room-temperature photoreflectance of strained In<i>x</i>Ga1−<i>x</i>As/Al<i>y</i>Ga1−<i>y</i>As undoped single quantum wells
14
Citations
31
References
1996
Year
Wide-bandgap SemiconductorCategoryquantum ElectronicsEngineeringBarrier CompositionSemiconductorsOptical PropertiesQuantum MaterialsPhotoluminescencePhysicsOptoelectronic MaterialsRoom-temperature Photoreflectance DataRoom-temperature PhotoreflectanceCategoryiii-v SemiconductorSolid-state PhysicBarrier OffsetDetailed AnalysisApplied PhysicsCondensed Matter PhysicsQuantum Photonic DeviceOptoelectronics
We report a detailed analysis of room-temperature photoreflectance data of four InxGa1−xAs/AlyGa1−yAs undoped strained single quantum wells with x≊0.20 and y≊0, 0.05, 0.10, and 0.20. We have compared our results with theoretical calculations based on an effective mass formalism, where possible variations of well and barrier composition and thickness have been included. For all the samples studied we have identified both allowed and forbidden transitions in the spectra and obtain good fits assuming a conduction-band offset Qc of 60%±5%. This detailed analysis shows for the first time that room-temperature photoreflectance measurements alone can be used to determine the well composition and thickness together with the barrier composition and the barrier offset.
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