Applied Physics Letters · 2012 · 76 citations · 16 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsAmorphous Electronic MaterialsAmorphous SemiconductorsMetal-oxide-semiconductor Field-effect TransistorsSemiconductor Device MaterialsThin Film Electrical PropertiesThin-film TransistorsAmorphous Indium Gallium Zinc OxideAmorphous Oxide SemiconductorsGate Dielectric EngineeringGate OxidesOxide DielectricsResponsivitySemiconductor Oxide Thin FilmsZinc Oxides
This study investigates the electrical performance of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) with a Ta2O5 gate dielectric under monochromatic illumination. The relationship between the phototransistor performance and oxygen partial pressure is determined. The oxygen content of the a-IGZO channel significantly affects the electrical and optical characteristics of a-IGZO TFTs. At applied gate biases of 0, 0, and 0.25 V, oxygen partial pressures of 0%, 0.1%, and 0.2% yielded measured device responsivities of 0.23, 0.44, and 4.75 A/W, respectively. Oxygen content can be used to control the mobility of TFTs, which can amplify photocurrent and enhance the responsivity of a-IGZO TFTs with a Ta2O5 gate dielectric.
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