The effect of deposition parameters on radiofrequency sputtered molybdenum thin films

Abstract

Employing r.f. (radiofrequency) magnetron sputtering, molybdenum thin films were fabricated on soda-lime glass substrates for use in Cu(In,Ga)Se2 based solar cells. The physical, electrical and structural properties of the films were studied as a function of two deposition parameters: argon pressure and r.f. power. The strain reversal from tensile to compressive occurs at high pressure and is found to decrease with increasing applied r.f. power. The grain sizes of films deduced from x-ray diffraction measurements (full width at half-maximum), and consistent with atomic force microscope images, increase with increasing argon pressure and power. The resistivity of the films was found to increase with increasing argon pressure and decrease with increasing r.f. power.