VUV laser (157 nm) chemical vapor deposition of high quality amorphous hydrogenated silicon: gas phase chemistry and modelling - Concepedia

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VUV laser (157 nm) chemical vapor deposition of high quality amorphous hydrogenated silicon: gas phase chemistry and modelling

16

Citations

23

References

1995

Year

H. Karstens, Jürgen Knobloch, Andreas Winkler, A. Pusel, Martin Barth, Peter Hess

Applied Surface Science

Materials ScienceEngineeringApplied PhysicsVuv LaserSemiconductor Device FabricationChemical Vapor DepositionAmorphous SolidPulsed Laser DepositionGas Phase ChemistrySilicon On Insulator

References

	Year	Citations

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