Publication | Closed Access
Effects of doping profile and post-growth annealing on spin injection from Fe into (Al,Ga)As heterostructures
23
Citations
26
References
2005
Year
Wide-bandgap SemiconductorEngineeringSpin-charge ConversionOptoelectronic DevicesSpintronic MaterialMagnetoresistanceSemiconductor DeviceSemiconductorsMagnetismQuantum MaterialsCompound SemiconductorPost-growth AnnealingSpin Injection EfficiencyMaterials ScienceSpin-orbit EffectsSpin-charge-orbit ConversionElectrical EngineeringSemiconductor TechnologyFe∕ga0.9al0.1as InterfaceSpintronicsFerromagnetismSpin InjectionNatural SciencesApplied PhysicsMultilayer HeterostructuresOptoelectronics
The influence of the Fe∕Ga0.9Al0.1As interface on spin injection into a spin light-emitting diode is studied. Spin injection is found to depend strongly on the interfacial doping profile demonstrating the importance of band bending in the semiconductor near the interface. The effect of post-growth annealing on spin injection from Fe contacts into GaAs-based spin light-emitting diodes is also examined. Post-growth annealing up to 250 °C is found to increase the spin injection efficiency. It is demonstrated that the annealing modifies electronic properties of the Fe∕Ga0.9Al0.1As interface, as evidenced by an increase of the Schottky barrier height.
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