Publication | Closed Access
Refractive index of a native oxide anodically grown on GaAs
18
Citations
11
References
1977
Year
Optical MaterialsEngineeringAnodic OxidesLaser ApplicationsOptical CharacterizationOptical PropertiesMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials SciencePhotonicsElectrical EngineeringOxide ElectronicsGallium OxideRefractive IndexGrown OxideElectro-optics DeviceApplied PhysicsOptoelectronics
The refractive index of an anodically grown oxide on GaAs has been measured throughout the visible and near infrared and the data fitted to a single oscillator Sellmeier equation. Accurate refractive-index data is required for possible use of anodic oxides as antireflection coatings on GaAs electro-optic devices. For 11 as-grown oxides the measured refractive index for λ=632.8 nm was n=1.7786±0.0138, while for five annealed oxides (259 °C for 1 h in N2) n=1.7469±0.0095. The calculated refractive index of annealed oxides at the emission wavelengths of interest for GaAs-AlGaAs fiber communication sources is n=1.724±0.006 at λ=890±20 nm.
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