Journal of Applied Physics · 1990 · 13 citations · 7 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsMagnetic Properties Of SolidsSemiconductor Crystal GrowthSilicon MaterialsCritical Oxygen ConcentrationCrystalline SiliconCzochralski Crystal GrowthCzochralski GrowthOxygen Concentration EffectsSilicon Crystal GrowthSingle-crystal SiliconStriation Formation
The growth striation, resistance homogeneity, and oxygen concentration of silicon single crystal grown by both magnetic Czochralski and Czochralski methods were investigated. Theoretical analysis of the experimental results, including effect of magnetic field on the temperature fluctuation, effective segregation coefficient (keff), and oxygen concentration are discussed.
7