Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

ENERGY DEPENDENCE OF ION-INDUCED SPUTTERING YIELDS FROM MONATOMIC SOLIDS AT NORMAL INCIDENCE

Yasunori Yamamura, H. Tawara · Atomic Data and Nuclear Data Tables · 1996 · 745 citations

Natural Sciences, Materials Science, Physics +4

Charged particle fluxes from planar magnetron sputtering sources

B. Window, N. Savvides · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 419 citations

Natural Sciences, Electrical Engineering, Physics +13

On the film density using high power impulse magnetron sputtering

Mattias Samuelsson, Daniel Lundin, J. Jensen et al. · Surface and Coatings Technology · 2010 · 416 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +11

Reactive magnetron sputtering of thin films: present status and trends

J. Musil, Pavel Baroch, J. Vlček et al. · Thin Solid Films · 2004 · 396 citations

Natural Sciences, Materials Science, Physics +16

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders, Joakim Andersson, Arutiun P. Ehiasarian · Journal of Applied Physics · 2007 · 345 citations · Full text

Natural Sciences, Materials Science, Physics +14