Effects of the biasing frequency on RIE of Cu in a Cl2-based discharge

The interaction of chlorine with copper

W. Sesselmann, T. J. Chuang · Surface Science · 1986 · 126 citations

Natural Sciences, Chemistry, Corrosion Science +9

Increase in the surface self-diffusion of copper due to the chemisorption of halogens

F. Delamare, G.E. Rhead · Surface Science · 1971 · 99 citations

Natural Sciences, Chemistry, Materials Science +12

Effects of frequency on optical emission, electrical, ion, and etching characteristics of a radio frequency chlorine plasma

Vincent M. Donnelly, Daniel Flamm, Richard H. Bruce · Journal of Applied Physics · 1985 · 91 citations

Natural Sciences, Chemistry, Plasma Physics +14

Reactive ion etching of copper in SiCl4-based plasmas

Brian J. Howard, Ch. Steinbrüchel · Applied Physics Letters · 1991 · 84 citations

Engineering, Materials Engineering, Materials Science +17

The interaction of chlorine with copper I. Adsorption and surface reaction

W. Sesselmann, T. J. Chuang · Surface Science Letters · 1986 · 82 citations

Natural Sciences, Chemical Engineering, Chemistry +14