Characterisation of an industrial plasma immersion ion implantation reactor with a Langmuir probe and an energy-selective mass spectrometer

Plasma source ion-implantation technique for surface modification of materials

J. R. Conrad, Joachim Radtke, R.A. Dodd et al. · Journal of Applied Physics · 1987 · 1.1K citations

Engineering, Target Fabrication, Mechanical Engineering +16

Pulsed high rate plasma etching with variable Si/SiO2 selectivity and variable Si etch profiles

R. W. Boswell, Daniel Henry · Applied Physics Letters · 1985 · 111 citations

High Rate Plasma, Electrical Engineering, Engineering +14

Measurements of pulsed-power modulated argon plasmas in an inductively coupled plasma source

Sumio Ashida, Moonsoo Shim, M. A. Lieberman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 102 citations

Engineering, Plasma Science, Plasma Physics +18

Etching in a pulsed plasma

R. W. Boswell, R. K. Porteous · Journal of Applied Physics · 1987 · 73 citations

Electrical Engineering, Continuous Plasma, Engineering +9

Simulations of multipactor-assisted breakdown in radio frequency plasmas

D. Vender, H. B. Smith, Rod Boswell · Journal of Applied Physics · 1996 · 51 citations

Engineering, Plasma Science, Plasma Physics +17