Journal of Physics D Applied Physics · 1975 · 37 citations · 18 references
Natural SciencesMaterials SciencePhysicsElectrochemistryRadiation PhysicsSurface ScienceCathode MaterialsOxide SemiconductorsPlasma-surface InteractionsArc ErosionCathode ErosionCathode ProcessesCharge TransportCrater FormationElectrode ErosionFilm ThicknessThin Oxide Films
Evidence is discussed which suggests that there are significant differences between the processes occurring when the films are <5-10 nm thick and those occurring when they are >10 nm thick. For the former, electron emission can occur by tunnelling at an average electric field of about 109 V m-1 whereas for the latter some evidence suggests that emission occurs when conducting filaments are electroformed through the film at an average field of 107-108 V m-1. The effects of UV irradiation on charge production and differences in crater rims between these two film thicknesses, and possible differences in positive ion current in the cathode fall region are discussed.
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Electrical phenomena in amorphous oxide films
G. Dearnaley, A.M. Stoneham, D. V. Morgan · Reports on Progress in Physics · 1970 · 729 citations · Full text