Applied Optics · 1985 · 61 citations · 4 references
Materials ScienceOptical MaterialsEngineeringCurrent DensityOxide ElectronicsSurface ScienceApplied PhysicsTitanium Dioxide MaterialsChemical Vapor DepositionThin Film Process TechnologyThin FilmsChemical DepositionSio2 FilmsIon EnergyThin Film ProcessingSio_2 Thin Films
TiO2 and SiO2 films deposited using ion assisted deposition are investigated as a function of ion energy and current density. Optical constants, possible ion source contaminants, and optical scatter are examined for samples deposited at ambient (∼75°C) and elevated (∼250°C) substrate temperatures.
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Ion-beam-assisted deposition of thin films
Peter Martin, H. A. Macleod, R. P. Netterfield et al. · Applied Optics · 1983 · 281 citations
Ion-assisted deposition of bulklike ZrO2 films
Philip Martin, R. P. Netterfield, W. G. Sainty et al. · Applied Physics Letters · 1983 · 41 citations · Full text
Surface smoothing effects of thin film deposition?
John R. McNeil, Lianghuan Wei, G. A. Al‐Jumaily et al. · Applied Optics · 1985 · 23 citations
Materials Science, Surface Characterization, Engineering +13