Direct bonding of silicon carbide wafers with a regular relief at the interface

Abstract

The direct bonding of two oxide-free 6H-SiC(0001) silicon carbide single crystal wafers, one smooth and another bearing an artificial microscopic relief, has been studied. According to the X-ray topography data, the bonded surface fraction reaches 85% of the total area. The pattern of stress distribution at the interface is aperiodic, which is indicative of an inhomogeneous microroughness of the surface of bonded wafers.