Nanoimprint Lithography Based Approach for the Fabrication of Large‐Area, Uniformly‐Oriented Plasmonic Arrays

Brandon Lucas, Jin‐Sung Kim, Christine Chin, L. Jay Guo

Advanced Materials · 2008 · 133 citations · 26 references

Concepts

Abstract

Large-area, uniformly oriented plasmonic arrays are fabricated using nanoimprint lithography. Excellent control of the Localized Surface Plasmon Resonance of the metallic arrays is demonstrated through nanoparticle material composition, size characteristics and polarization effects. This method offers a promising fabrication alternative to exploit LSPR-based applications such as biosensing and surface-enhanced spectroscopies.

References

26