Publication | Open Access
IrSi1.75 a new semiconductor compound
44
Citations
11
References
1982
Year
Thin Film PhysicsOptical MaterialsEngineeringSemiconductor MaterialsOptoelectronic DevicesThin Film Process TechnologyBand GapSemiconductorsHall Effect MeasurementsCompound SemiconductorThin Film ProcessingMaterials ScienceOptoelectronic MaterialsThin Film MaterialsSemiconductor MaterialNew Semiconductor CompoundThin Film LayersApplied PhysicsThin FilmsOptoelectronicsSolar Cell Materials
Optical and Hall effect measurements on thin film layers of polycrystalline IrSi1.75 show that this material is a semiconductor. The band gap is approximately 1.2 eV. The films obtained saturated with silicon were p-type with a charge carrier density of the order of 4×1017 cm−3.
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