Temperature-Dependent Characteristics of the Inverted Delta-Doped V-Shaped InGaP/In_xGa_1-xAs/GaAs Pseudomorphic Transistors

Abstract

The temperature-dependent characteristics of InGaP/In x Ga 1- x As/GaAs pseudomorphic transistors with an inverted delta-doped V-shaped channel have been studied. Due to the presented wide-gap InGaP Schottky layer and the V-shaped channel structure, the degradation of device performance with increasing the temperature is not so significant. Experimentally, for a 1×100 µm 2 device, the gate-drain voltages at a gate leakage current of 260 µA/mm and the maximum transconductances g m,max are 30 (22.2) V and 201 (169) mS/mm at the temperature of 300 K (450 K), respectively. Meanwhile, the broad and flat drain current operation regimes for high g m , f T , and f max are obtained.