Publication | Closed Access
A thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch
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Citations
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References
2012
Year
Materials ScienceEngineeringPhysicsMicrofabricationOptical PropertiesSpectroscopyMicrometric SiliconApplied PhysicsAtmospheric PressureNatural SciencesInfrared SpectroscopyVacuum DeviceSilicon On InsulatorPlasma Processing
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