Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 10 citations · 0 references
Natural SciencesMaterials EngineeringMaterials SciencePolymer ChemistryPolymer EngineeringPolymer MaterialsOptical PolymersPolymer CharacterizationPolymer Thin FilmsBeam ExposureElectron Beam OpticsPhotoinitiator ChemistryPhotopolymer MaterialsPhotoresist ChemistryPhotoresistsStar Polymer ArchitectureStar Polymers
Linear and star-shaped ArF photoresists were prepared and preliminary lithographic comparison was performed using electron-beam exposure. An oligo-initiator based on saccharose forms the core of the star shaped photoresist from which three standard ArF photoresist monomers, α-gamma butyrolactone methacrylate (GBLMA), methyl adamantyl methacrylate (MAMA) and hydroxyl adamantyl methacrylate (HAMA) were polymerized. Conditions were adjusted to obtain a low polydispersity, 6 kg/mol star polymer with a degree of polymerization of approximately five mers per arm. For comparison, a linear photoresist control was prepared using the same scheme. The star resist architecture was found to improve roughness without reducing sensitivity or resolution.