Submicrometre lift-off line with T-shaped cross-sectional form

Abstract

A fine metal line with T-shaped cross-sectional form was fabricated by a lift-off technique using the double-layer electron beam resist method. The minimum lower and upper widths of the T-shaped cross-section were 0.2 μm and 0.7 μm, respectively, and, keeping the lower width within 0.3 μm, we could increase the upper width at will.