Compositional investigation of sputtered amorphous SiOX:H

Oxygen-bonding environments in glow-discharge-deposited amorphous silicon-hydrogen alloy films

G. Lucovsky, J. Yang, S. S. Chao et al. · Physical review. B, Condensed matter · 1983 · 431 citations

Engineering, Optoelectronic Devices, Chemistry +20

Electronic and structural properties of plasma-deposited a-Si:O:H - The story of O2

J. C. Knights, R. A. Street, G. Lucovsky · Journal of Non-Crystalline Solids · 1980 · 132 citations

Materials Science, Ii-vi Semiconductor, Structural Properties +9

Critical investigation of the infrared-transmission-data analysis of hydrogenated amorphous silicon alloys

N. Maley · Physical review. B, Condensed matter · 1992 · 120 citations

Optical Materials, Engineering, Absorption Spectroscopy +22

Effect of oxygen on the optoelectronic properties of amorphous hydrogenated silicon

B. G. Yacobi, R. W. Collins, Garret Moddel et al. · Physical review. B, Condensed matter · 1981 · 53 citations

Optical Materials, Engineering, Optoelectronic Devices +20

Infrared, Raman, and X‐Ray Diffraction Studies of Silicon Oxide Films Formed from SiH4 and  N 2 O  Chemical Vapor Deposition

Minoru Nakamura, Yasuhiro Mochizuki, Katsuhisa Usami et al. · Journal of The Electrochemical Society · 1985 · 46 citations · Full text

Optical Materials, Engineering, Thin Film Process Technology +18