Conditions for the routine preparation of tantalum/aluminium films

Annealing and phase stability of tantalum films sputtered in Ar-O2

L.G. Feinstein, R.D. Huttemann · Thin Solid Films · 1974 · 28 citations

Materials Engineering, Materials Science, Engineering +8

Electrical and Structural Properties of Co-Sputtered Tantalum–Aluminum Films

C. A. Steidel · Journal of Vacuum Science and Technology · 1969 · 27 citations

Materials Engineering, Materials Science, Engineering +13

Tantalum thin film resistors

R.G. Duckworth · Thin Solid Films · 1972 · 16 citations

Materials Science, Engineering, Resistor +3

Compositional Control of Tantalum–Aluminum Alloy Films by a dc Biased, ac Sputtering Technique

C. A. Steidel, D. A. Jaffe, Hiromu Kumagai · Journal of Vacuum Science and Technology · 1972 · 10 citations

Materials Science, Materials Engineering, Electrical Engineering +15