Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination - Concepedia

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Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination

124

Citations

1

References

2002

Year

Yun-Ju Chuang, Fan‐Gang Tseng, Wen Kuang Lin

Microsystem Technologies

Diffraction EffectShort Wavelength OpticEngineeringPhotochemistryUv-vis SpectroscopyOptical PropertiesApplied PhysicsUv ExposureOptoelectronicsAir Gap Elimination

References

	Year	Citations

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