Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma

Infrared spectroscopic study of SiO<i>x</i> films produced by plasma enhanced chemical vapor deposition

P. G. Pai, S. S. Chao, Yasuo Takagi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 799 citations

Natural Sciences, Chemistry, Materials Science +17

Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization

A. Grill, Deborah A. Neumayer · Journal of Applied Physics · 2003 · 687 citations

Natural Sciences, Materials Engineering, Materials Science +17

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

G. A. C. M. Spierings · Journal of Materials Science · 1993 · 403 citations

Natural Sciences, Materials Engineering, Materials Science +13

Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge

F. Massines, Nicolas Ghérardi, Antonella Fornelli et al. · Surface and Coatings Technology · 2005 · 212 citations

Natural Sciences, Materials Science, Physics +14

Characterization of silica gels by infrared reflection spectroscopy

Rui M. Almeida, Theresa A. Guiton, Carlo G. Pantano · Journal of Non-Crystalline Solids · 1990 · 208 citations

Natural Sciences, Chemistry, Materials Science +12