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Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Materials EngineeringMaterials ScienceEngineeringDeposition ParametersSurface ScienceApplied PhysicsTin Thin FilmsStep CoverageChemical Vapor DepositionThin FilmsChemical DepositionPlasma ProcessingThin Film Processing