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Electrical and optical properties of Fe-doped semi-insulating GaN templates
60
Citations
15
References
2003
Year
SemiconductorsWide-bandgap SemiconductorElectrical EngineeringElectronic DevicesEngineeringSemiconductor TechnologyOptical PropertiesRoom-temperature Sheet ResistivityApplied PhysicsAluminum Gallium NitrideSemi-insulating Gan FilmsGan Power DeviceFermi LevelThin FilmsCategoryiii-v SemiconductorOptoelectronicsElectrical Insulation
Electrical and optical properties of semi-insulating GaN films with the lower part of the film doped with Fe were studied. The room-temperature sheet resistivity of the films was found to be 2×1010 Ω/square. The activation energy of the dark conductivity was ∼0.5 eV which corresponds to the depth of the dominant electron traps pinning the Fermi level. The concentration of these traps was highest in the Fe-doped portion of the films and was on the order of 3×1016 cm−3. Photoinduced current transient spectroscopy also showed the presence of a high concentration of deeper electron traps with level at EC−0.9 eV and hole traps at EV+0.9 eV. These layers look very promising as insulating buffers for AlGaN/GaN transistor structures.
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