0.1-μm InAlAs/InGaAs HEMTS with an InP-recess-etch stopper grown by MOCVD

T. Enoki, Hiroshi Itô, Kenji Ikuta, Yohtaro Umeda, Y. Ishii

Microwave and Optical Technology Letters · 1996 · 27 citations · 7 references

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Abstract

High-performance InAlAs/InGaAs HEMTs with a highly uniform threshold voltage are fabricated using an InP-recess-etch stopper. Recess-depth control is improved, and design of the device characteristics is made easier. An SCFL ring oscillator with a propagation delay time of 6.6 ps/gate is achieved with these HEMTs. © 1996 John Wiley & Sons, Inc.

References

7