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Inductively coupled plasma etching of nano-patterned sapphire for flip-chip GaN light emitting diode applications

Electrical EngineeringSolid-state LightingEngineeringNanoelectronicsFlip-chip GanApplied PhysicsAluminum Gallium NitrideDiode ApplicationsGan Power DeviceNano-patterned SapphireMicroelectronicsPlasma EtchingOptoelectronicsCategoryiii-v Semiconductor