Periodic morphological modification developed on the surface of polyethersulfone by XeCl excimer laser photoablation

Abstract

Periodic and stable micropatterns appeared on the surface of amorphous polyethersulfone etched with an excimer laser at 308 nm in ambient air and a vacuum. The control of such radiative conditions as fluence and incident angle enables us to modify the spacing and pattern of the microstructures. A topographical investigation with scanning electron microscopy and an experiment with x-ray photoelectron spectroscopy to determine its composition is reported.